An experiment was run in a semiconductor fabrication plant in an effort to increase yield. Five
factors, each at two levels, were studied. The factors (and levels) were A = aperture setting
(small, large), B = exposure time (20% below nominal, 20% above nominal), C = development
time (30 and 45 seconds), D = mask dimension (small, large), and E = etch time (14.5 and 15.5
minutes). The following unreplicated
design was run:
Suppose that a center point with five replicates is added to the factorial runs and the responses
are 45, 40, 41, 47, and 43.
(a) Estimate the experimental error using the center points. Compare this to the estimate obtained
by pooling out apparently nonsigninficant effects.
(b) Test for curvature with
.
SOLUTION
(a)
Estimated Effects and Coefficients for y (coded units)